H2O2-Treated ZnO Nanostructures for Humidity-Tolerant O3 Chemiresistors Operated under Pulsed UV Light Modulation

doi:10.1021/acsanm.3c03742

	H₂O₂-Treated ZnO Nanostructures for Humidity-Tolerant O₃ Chemiresistors Operated under Pulsed UV Light Modulation
	Mi, Longqing 3,4,5,6; Deng, Zanhong 3,5,6; Chang, Junqing 3,5,6; Li, Meng 4,5,6; Zhang, Ruofan 4,5,6; Wang, Shimao 3,5,6; You, Libing 2; Fang, Xiaodong 2; He, Yong 1; Meng, Gang 3,5,6
刊名	ACS APPLIED NANO MATERIALS
	2023-09-08
卷号	6
关键词	sensitive O-3 chemiresistor humidity-tolerant room temperature pulsed UV light modulation H2O2 treatment
DOI	10.1021/acsanm.3c03742
通讯作者	Fang, Xiaodong(fangxiaodong@sztu.edu.cn) ; Meng, Gang(menggang@aiofm.ac.cn)
英文摘要	Severe humidity interference or even poison, especially at room temperature (RT), poses a challenge for the practical application of metal oxide semiconductor (MOS)-based chemiresistors for the monitoring of hazardous O-3 vapor in a real humid air background, owing to the intrinsic hydrophilicity of general MOSs. Herein, we demonstrated that the humiditytolerance performance of an ultraviolet (UV)-activated ZnO chemiresistor (operated at RT) toward O-3 could be drastically improved by a facile H2O2 treatment. The onset of humidity poison starts around a relative humidity (RH) of 30% for a pristine ZnO chemiresistor, while the H2O2-treated ZnO (H2O2-ZnO) chemiresistor enables robust operation under a highly humid air background (90% RH). The response of ppb-level O-3 under humid air could be further enhanced by pulsed UV light modulation (PULM) operation, and a high response (25 for 350 ppb of O-3) could be achieved at RT and 90% RH, which is comparable or even higher than that of the state-of-the-art O3 chemiresistors (including the commercial MQ131 O-3 sensor operated at 200 degrees C). The passivation of surface oxygen vacancy (V-O) defects and reduction of grain size via H2O2 treatment probably enhance the humidity tolerance. Our work may shed light on the design of high-performance humidity-tolerant RT MOS chemiresistors for monitoring hazardous gases in ambient humid air.
资助项目	CAS-NSTDA Joint Research Projects[GJHZ202101] ; National Natural Science Foundation of China[62075223] ; National Natural Science Foundation of China[62175167] ; Shenzhen Science and Technology Program[JCYJ20210324120207021] ; Shenzhen Science and Technology Program[KQTD20170331115422184] ; Shenzhen Science and Technology Program[JSGG20220831094202005] ; Guangdong Provincial Science and Technology Program[2021QN02Z552] ; Key Lab of Photovoltaic and Energy Conservation Materials[PECL2021QN001]
WOS关键词	GAS SENSOR ; SENSING RESPONSE ; OZONE ; FILM ; NANOCRYSTALS ; ETHANOL
WOS研究方向	Science & Technology - Other Topics ; Materials Science
语种	英语
出版者	AMER CHEMICAL SOC
WOS记录号	WOS:001065637000001
资助机构	CAS-NSTDA Joint Research Projects ; National Natural Science Foundation of China ; Shenzhen Science and Technology Program ; Guangdong Provincial Science and Technology Program ; Key Lab of Photovoltaic and Energy Conservation Materials
内容类型	期刊论文
源URL	[http://ir.hfcas.ac.cn:8080/handle/334002/132631]
专题	中国科学院合肥物质科学研究院
通讯作者	Fang, Xiaodong; Meng, Gang
作者单位	1.Chongqing Univ, Coll Optoelect Engn, Key Lab Optoelect Technol & Syst, Educ Minist China, Chongqing 400044, Peoples R China 2.Shenzhen Technol Univ, Coll New Mat & New Energies, Shenzhen 518118, Peoples R China 3.Adv Laser Technol Lab Anhui Prov, Hefei 230037, Peoples R China 4.Univ Sci & Technol China, Hefei 230026, Peoples R China 5.Chinese Acad Sci, Key Lab Photovolta & Energy Conservat Mat, Hefei 230031, Peoples R China 6.Chinese Acad Sci, Anhui Inst Opt & Fine Mech, Anhui Prov Key Lab Photon Devices & Mat, Hefei 230031, Peoples R China
推荐引用方式 GB/T 7714	Mi, Longqing,Deng, Zanhong,Chang, Junqing,et al. H₂O₂-Treated ZnO Nanostructures for Humidity-Tolerant O₃ Chemiresistors Operated under Pulsed UV Light Modulation[J]. ACS APPLIED NANO MATERIALS,2023,6.
APA	Mi, Longqing.,Deng, Zanhong.,Chang, Junqing.,Li, Meng.,Zhang, Ruofan.,...&Meng, Gang.(2023).H₂O₂-Treated ZnO Nanostructures for Humidity-Tolerant O₃ Chemiresistors Operated under Pulsed UV Light Modulation.ACS APPLIED NANO MATERIALS,6.
MLA	Mi, Longqing,et al."H₂O₂-Treated ZnO Nanostructures for Humidity-Tolerant O₃ Chemiresistors Operated under Pulsed UV Light Modulation".ACS APPLIED NANO MATERIALS 6(2023).