Boosting Photoelectrochemical Performance of BiVO4through Photoassisted Self-Reduction

doi:10.1021/acsaem.0c00109

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	Boosting Photoelectrochemical Performance of BiVO4through Photoassisted Self-Reduction
	Yin, Xiang 3; Li, Jie 3; Du, Libo 3; Zhan, Faqi 1; Kawashima, Kenta 2; Li, Wenzhang 3; Qiu, Weixin 3; Liu, Yang 3; Yang, Xuetao 3; Wang, Keke 3
刊名	ACS Applied Energy Materials
	2020-05-26
卷号	3 期号:5 页码:4403-4410
关键词	Carrier concentration Electrocatalysts Hall mobility Hole mobility Iron compounds Nickel compounds Charge mobilities Charge recombinations Charge separations Photocurrent density Photoelectrochemical performance Photoelectrochemical water splitting Reversible hydrogen electrodes Sacrificial agents
ISSN号	2574-0962
DOI	10.1021/acsaem.0c00109
英文摘要	The photoelectrochemical water splitting of monoclinic bismuth vanadate (BiVO4) suffers from sluggish charge mobility as well as substantial charge recombination losses. Here, we treated the BiVO4 by using a photoassisted self-reduction method based on the fact that the self-reduction potential of BiVO4 is more positive than its conduction band. The BiVO4 photoanode subjected to this treatment has a more negative onset potential and higher photovoltage compared with bare BiVO4. Moreover, its charge carrier density and mobility are increased and accelerated compared to bare BiVO4. As a result, the charge separation efficiency reaches to approximate 94% at 1.23 V vs the reversible hydrogen electrode (RHE), and the photocurrent densities are 3.18 and 5.84 mA/cm2 (at 1.23 V vs RHE) in the absence and presence of the sacrificial agent, respectively. In particular, the reduced BiVO4 with electrocatalysts (FeOOH/NiOOH) achieves a photocurrent of 5.06 mA/cm2 at 1.23 V vs RHE, which is 2.54 times higher than that of the bare BiVO4. This approach provides a new strategy for designing a semiconductor-based photoanode with superior performance for photoelectrochemical water splitting. © 2020 American Chemical Society.
WOS研究方向	Chemistry ; Energy & Fuels ; Materials Science
语种	英语
出版者	American Chemical Society
WOS记录号	WOS:000537656400040
内容类型	期刊论文
源URL	[http://ir.lut.edu.cn/handle/2XXMBERH/115614]
专题	省部共建有色金属先进加工与再利用国家重点实验室
作者单位	1.State Key Laboratory of Advanced Processing and Recycling of Non-Ferrous Metals, Lanzhou University of Technology, Lanzhou, Gansu; 730050, China; 2.McKetta Department of Chemical Engineering, University of Texas at Austin, Austin; TX; 78712, United States 3.School of Chemistry and Chemical Engineering, Central South University, Changsha, Hunan; 410083, China;
推荐引用方式 GB/T 7714	Yin, Xiang,Li, Jie,Du, Libo,et al. Boosting Photoelectrochemical Performance of BiVO4through Photoassisted Self-Reduction[J]. ACS Applied Energy Materials,2020,3(5):4403-4410.
APA	Yin, Xiang.,Li, Jie.,Du, Libo.,Zhan, Faqi.,Kawashima, Kenta.,...&Mullins, C. Buddie.(2020).Boosting Photoelectrochemical Performance of BiVO4through Photoassisted Self-Reduction.ACS Applied Energy Materials,3(5),4403-4410.
MLA	Yin, Xiang,et al."Boosting Photoelectrochemical Performance of BiVO4through Photoassisted Self-Reduction".ACS Applied Energy Materials 3.5(2020):4403-4410.