Single-Dislocation Schottky Diodes | |
Tao, Ang3,4; Yao, Tingting3,4; Jiang, Yixiao3,4; Yang, Lixin3; Yan, Xuexi3; Ohta, Hiromichi5; Ikuhara, Yuichi1,6,7; Chen, Chunlin3,4; Ye, Hengqiang4; Ma, Xiuliang2,3 | |
刊名 | NANO LETTERS |
2021-07-14 | |
卷号 | 21期号:13页码:5586-5592 |
关键词 | dislocation Schottky diode conductive atomic force microscopy transmission electron microscopy first-principles calculations |
ISSN号 | 1530-6984 |
DOI | 10.1021/acs.nanolett.1c01081 |
英文摘要 | Dislocations often exhibit unique physical properties distinct from those of the bulk material. However, functional applications of dislocations are challenging due to difficulties in the construction of high-performance devices of dislocations. Here we demonstrate unidirectional single-dislocation Schottky diode arrays in a Fe2O3 thin film on Nb-doped SrTiO3 substrates. Conductivity measurements using conductive atomic force microscopy indicate that a net current will flow through individual dislocation Schottky diodes under forward bias and disappear under reverse bias. Under cyclic bias voltages, the single-dislocation Schottky diodes exhibit a distinct resistive switching behavior containing low-resistance and high-resistance states with a high resistance ratio of similar to 10(3). A combined study of transmission electron microscopy and first-principles calculations reveals that the Fe2O3 dislocations comprise mixed Fe2+ and Fe3+ ions due to O deficiency and exhibit a one-dimensional electrical conductivity. The single-dislocation Schottky diodes may find applications for developing ultrahigh-density electronic and memory devices. |
WOS研究方向 | Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics |
语种 | 英语 |
出版者 | AMER CHEMICAL SOC |
WOS记录号 | WOS:000674354200019 |
内容类型 | 期刊论文 |
源URL | [http://ir.lut.edu.cn/handle/2XXMBERH/148551] |
专题 | 材料科学与工程学院_特聘教授组 |
作者单位 | 1.Tohoku Univ, Adv Inst Mat Res, Sendai, Miyagi 9808577, Japan; 2.Lanzhou Univ Technol, State Key Lab Adv Proc & Recycling Nonferrous Met, Lanzhou 730050, Peoples R China 3.Chinese Acad Sci, Univ Sci & Technol China, Sch Mat Sci & Engn, Inst Met Res,Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China; 4.Ji Hua Lab, Foshan 528200, Peoples R China; 5.Hokkaido Univ, Res Inst Elect Sci, Sapporo, Hokkaido 0010020, Japan; 6.Japan Fine Ceram Ctr, Nanostruct Res Lab, Nagoya, Aichi 4568587, Japan; 7.Univ Tokyo, Inst Engn Innovat, Tokyo 1138656, Japan; |
推荐引用方式 GB/T 7714 | Tao, Ang,Yao, Tingting,Jiang, Yixiao,et al. Single-Dislocation Schottky Diodes[J]. NANO LETTERS,2021,21(13):5586-5592. |
APA | Tao, Ang.,Yao, Tingting.,Jiang, Yixiao.,Yang, Lixin.,Yan, Xuexi.,...&Ma, Xiuliang.(2021).Single-Dislocation Schottky Diodes.NANO LETTERS,21(13),5586-5592. |
MLA | Tao, Ang,et al."Single-Dislocation Schottky Diodes".NANO LETTERS 21.13(2021):5586-5592. |
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