Influence of additives on electroplated copper films and shear strength of SAC305/Cu solder joints
Zhang, Xudong1; Hu, Xiaowu1; Jiang, Xiongxin1; Zhou, Liuru1; Li, Qinglin2
刊名JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
2020-02
卷号31期号:3页码:2320-2330
关键词Additives Atomic force microscopy Binary alloys Chlorine compounds Copper Copper compounds Electron probe microanalysis Electrons High resolution transmission electron microscopy Metallic films Scanning electron microscopy Tin alloys Tin metallography X ray photoelectron spectroscopy Crystallographic orientations Electron back scatter diffraction Electroplated copper film Electroplated Cu films Impurity incorporation Micro-structural characterization Microstructural instability Plating solutions
ISSN号0957-4522
DOI10.1007/s10854-019-02764-1
英文摘要An accelerator, 3-(2-benzothiazolylthio)-1-propanesulfonsaure (ZPS), and a suppressor, polyethylene glycol (PEG), were employed and formulated with chloride ions (Cl-) in plating solution containing electrolytes (CuSO4 and H2SO4) to prepare Cu film, respectively. Microstructural characterization using transmission electron microscopy and electron backscatter diffraction revealed that the addition of PEG could inhibit the formation of twins and the ZPS had a significant promoting effect. The results of X-ray diffraction indicated the preferred crystallographic orientation (200) of entire electroplated Cu films was changed with the addition of PEG in basic plating solution. The function of ZPS altered the preferred crystallographic orientation from (200) to (111). The roughness of electroplated Cu film was analyzed by scanning electron microscopy and atomic force microscopy. The Cu grain size increased and the Cu surface became rough (RMS: 238.4 nm) under the function of ZPS. The impurity examination based on X-ray photoelectron spectroscopy and electron microprobe analysis indicated that the addition of PEG and ZPS resulted in high-level impurity incorporation, inducing the formation of massive voids within Cu3Sn layer and causing the microstructural instability of the SAC305/Cu solder joints during aging.
WOS研究方向Engineering ; Materials Science ; Physics
语种英语
出版者SPRINGER
WOS记录号WOS:000512889300056
状态已发表
内容类型期刊论文
源URL[http://ir.lut.edu.cn/handle/2XXMBERH/76625]  
专题省部共建有色金属先进加工与再利用国家重点实验室
材料科学与工程学院
通讯作者Hu, Xiaowu
作者单位1.Nanchang Univ, Mech & Elect Engn Sch, Key Lab Robot & Welding Automat Jiangxi Prov, Nanchang 330031, Jiangxi, Peoples R China
2.Lanzhou Univ Technol, State Key Lab Adv Proc & Recycling Nonferrous Met, Lanzhou 730050, Peoples R China
推荐引用方式
GB/T 7714
Zhang, Xudong,Hu, Xiaowu,Jiang, Xiongxin,et al. Influence of additives on electroplated copper films and shear strength of SAC305/Cu solder joints[J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,2020,31(3):2320-2330.
APA Zhang, Xudong,Hu, Xiaowu,Jiang, Xiongxin,Zhou, Liuru,&Li, Qinglin.(2020).Influence of additives on electroplated copper films and shear strength of SAC305/Cu solder joints.JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,31(3),2320-2330.
MLA Zhang, Xudong,et al."Influence of additives on electroplated copper films and shear strength of SAC305/Cu solder joints".JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS 31.3(2020):2320-2330.
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace