Shear mechanical property of beta-Si3N4 nano-thin layers in the basal plane using molecular dynamics simulations

doi:10.1016/j.msea.2015.09.031

	Shear mechanical property of beta-Si3N4 nano-thin layers in the basal plane using molecular dynamics simulations
	Lu, Xuefeng; Guo, Xin; Yin, Jianbo; Wei, Yupeng; Nan, Xueli; Dong, Qizheng; Ma, Yingxia; La, Peiqing
刊名	MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
	2015-11-11
卷号	648 页码:72-79
关键词	Silicon nitride Thin layer Shear mechanical property Fracture mechanism Molecular dynamics
ISSN号	0921-5093
DOI	10.1016/j.msea.2015.09.031
英文摘要	Molecular dynamics simulations are performed to clarify the shear mechanical property of beta-Si3N4 nano-thin layer in the basal plane with different extreme strain rates and loading temperatures. The thin layer displays nonlinear and linear response stress-strain relationships, and fracture stresses and strains increase gradually with increasing the strain rates, which is attributed to the appearance of a great quantity of single nitrogen atom and "turtle-like" hexagon defects. With increasing loading temperature, there is a noticeable drop in both fracture stress and fracture strain. In the higher loading temperature range, the lower fracture stresses are obtained owing to the disappearance of defects mentioned above, which can be also elaborated by a combination of factors such as the appeared N-6h-Si bond breaking alone in configuration evolution and the accompanied lower total energy. (C) 2015 Elsevier B.V. All rights reserved.
资助项目	National Natural Science Foundation of China[51402142][51164022][21301084] ; China Postdoctoral Science Foundation[2015M572615] ; Gansu Provincial Youth Science and Technology Fund Projects[1310RJYA006][1310RJZA081][148RJZA001] ; Program for Hongliu Young Teachers in Lanzhou University of Technology[Q201401] ; Gansu Provincial Science and Technology Support Program[1304GKCA027] ; Gansu Provincial Department of Construction Project[1201ZTC042]
WOS研究方向	Science & Technology - Other Topics ; Materials Science ; Metallurgy & Metallurgical Engineering
语种	英语
出版者	ELSEVIER SCIENCE SA
WOS记录号	WOS:000363820700012
状态	已发表
内容类型	期刊论文
源URL	[http://119.78.100.223/handle/2XXMBERH/33929]
专题	材料科学与工程学院省部共建有色金属先进加工与再利用国家重点实验室
通讯作者	Lu, Xuefeng
作者单位	Lanzhou Univ Technol, State Key Lab Adv Proc & Recycling Nonferrous Met, Lanzhou 730050, Peoples R China
推荐引用方式 GB/T 7714	Lu, Xuefeng,Guo, Xin,Yin, Jianbo,et al. Shear mechanical property of beta-Si3N4 nano-thin layers in the basal plane using molecular dynamics simulations[J]. MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING,2015,648:72-79.
APA	Lu, Xuefeng.,Guo, Xin.,Yin, Jianbo.,Wei, Yupeng.,Nan, Xueli.,...&La, Peiqing.(2015).Shear mechanical property of beta-Si3N4 nano-thin layers in the basal plane using molecular dynamics simulations.MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING,648,72-79.
MLA	Lu, Xuefeng,et al."Shear mechanical property of beta-Si3N4 nano-thin layers in the basal plane using molecular dynamics simulations".MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING 648(2015):72-79.