Plasma-ion-assisted deposition of HfO2 films with low UV absorption

doi:10.1016/j.surfcoat.2020.125691

CORC > 长春光学精密机械与物理研究所 > 中国科学院长春光学精密机械与物理研究所

	Plasma-ion-assisted deposition of HfO2 films with low UV absorption
	W. Y. Deng,C. S. Jin,C. Li,S. Yao,B. Yu and Y. Liu
刊名	Surface & Coatings Technology
	2020
卷号	395 页码:12
ISSN号	0257-8972
DOI	10.1016/j.surfcoat.2020.125691
英文摘要	HfO2 films were fabricated by plasma-ion-assisted deposition of electron beam evaporation (PIAD-EBE) for low absorption applications in UV. The optical, structural and composition properties of the deposited HfO2 films were systematically investigated to evaluate the influence and its mechanism of four kind process parameters. The results revealed that the crystal orientation of the monoclinic phase in the HfO2 films was very sensitive to momentum transfer originating from the plasma ions or the substrate temperature. Besides, the evolution of the crystal orientation with momentum transfer showed a strong correlation with the refractive index and its inhomogeneity in the HfO2 films. An optimized HfO2 film with very low extinction coefficients and high refractive index, which was critical to UV applications such as HR mirrors and solar-blind filters, was obtained.
URL标识	查看原文
语种	英语
内容类型	期刊论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/64793]
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	W. Y. Deng,C. S. Jin,C. Li,S. Yao,B. Yu and Y. Liu. Plasma-ion-assisted deposition of HfO2 films with low UV absorption[J]. Surface & Coatings Technology,2020,395:12.
APA	W. Y. Deng,C. S. Jin,C. Li,S. Yao,B. Yu and Y. Liu.(2020).Plasma-ion-assisted deposition of HfO2 films with low UV absorption.Surface & Coatings Technology,395,12.
MLA	W. Y. Deng,C. S. Jin,C. Li,S. Yao,B. Yu and Y. Liu."Plasma-ion-assisted deposition of HfO2 films with low UV absorption".Surface & Coatings Technology 395(2020):12.