Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films

	Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films
	Cheng, Shimin 1,2,3; Gao, Huiping 1,2; Ren, Tong 1,2; Ying, Pinliang 1,2; Li, Can 1,2
刊名	thin solid films
	2012-06-01
卷号	520 期号:16 页码:5155-5160
关键词	Silicon Thin films Catalytic chemical vapor deposition Carbonized tantalum Catalyst ageing X-ray diffraction Raman spectroscopy
通讯作者	李灿
产权排序	1,1
英文摘要	catalytic chemical vapor deposition (cat-cvd) has been demonstrated as a promising way to prepare device-quality silicon films. however, catalyst ageing due to si contamination is an urgency to be solved for the practical application of the technique. in this study, the effect of carbonization of tantalum catalyst on its structure and performance was investigated. the carbonized ta catalyst has a tac surface layer which is preserved over the temperature range between 1450 and 1750 degrees c and no si contamination occurs on the catalyst after long-term use. si film prepared using the carbonized ta catalyst has a similar crystal structure to that prepared by uncarbonized ta catalyst. formation of the tac surface layer can alleviate the ageing problem of the catalyst, which shows great potential as a stable catalyst for cat-cvd of si films. (c) 2012 published by elsevier b.v.
学科主题	物理化学
WOS标题词	science & technology ; technology ; physical sciences
类目[WOS]	materials science, multidisciplinary ; materials science, coatings & films ; physics, applied ; physics, condensed matter
研究领域[WOS]	materials science ; physics
关键词[WOS]	hot-wire cvd ; hydrogenated amorphous-silicon ; a-si-h ; cat-cvd ; polycrystalline silicon ; diamond deposition ; tungsten catalyzer ; device-quality ; solar-cells ; thin-film
收录类别	SCI
语种	英语
WOS记录号	WOS:000305719000008
公开日期	2013-10-11
内容类型	期刊论文
源URL	[http://159.226.238.44/handle/321008/117873]
专题	大连化学物理研究所_中国科学院大连化学物理研究所
作者单位	1.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian 116023, Peoples R China 2.Dalian Natl Lab Clean Energy, Dalian 116023, Peoples R China 3.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
推荐引用方式 GB/T 7714	Cheng, Shimin,Gao, Huiping,Ren, Tong,et al. Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films[J]. thin solid films,2012,520(16):5155-5160.
APA	Cheng, Shimin,Gao, Huiping,Ren, Tong,Ying, Pinliang,&Li, Can.(2012).Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films.thin solid films,520(16),5155-5160.
MLA	Cheng, Shimin,et al."Carbonized tantalum catalysts for catalytic chemical vapor deposition of silicon films".thin solid films 520.16(2012):5155-5160.