Intensity modulation based optical proximity optimization for the maskless lithography

doi:10.1364/OE.381503

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微电子装备总体研究室（四室）

	Intensity modulation based optical proximity optimization for the maskless lithography
	Liu, Jianghui 3; Liu, Junbo ; Deng, Qingyuan 2; Feng, Jinhua ; Zhou, Shaolin 1; Hu, Song
刊名	OPTICS EXPRESS
	2020-01-06
卷号	28 期号:1 页码:548-557
ISSN号	1094-4087
DOI	10.1364/OE.381503
文献子类	期刊论文
英文摘要	The undesirable optical proximity effect (OPE) that appeared in the digital micro-mirrors device (DMD) based maskless lithography directly influences the final exposure pattern and decreases the lithography quality. In this manuscript, a convenient method of intensity modulation applied for the maskless lithography is proposed to optimize such an effect. According to the pulse width modulation based image recognition of DMD, we replaced the digital binary mask with a special digital grayscale mask to modulate the UV intensity distribution to be closer to the expectation in a way of point-by-point modification. The exposure result applying the grayscale mask has a better consistency with the design pattern than that for the case in which the original binary mask is used. The effectiveness of this method was analyzed by the image subtraction technique. Experimental data revealed that the matching rate between the exposure pattern and the mask pattern has been improved from 78% to 91%. Besides, more experiments have been conducted to verify the validity of this method for the optical proximity optimization and its potential in the high-fidelity DMD based maskless lithography. (C) 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
WOS关键词	DIGITAL MICROMIRROR DEVICE ; FABRICATION
语种	英语
WOS记录号	WOS:000509352500045
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/10166]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	1.Chongqing Univ Posts & Telecommun, Sch Automat, Chongqing 400065, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 3.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610729, Peoples R China 4.South China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510640, Peoples R China
推荐引用方式 GB/T 7714	Liu, Jianghui,Liu, Junbo,Deng, Qingyuan,et al. Intensity modulation based optical proximity optimization for the maskless lithography[J]. OPTICS EXPRESS,2020,28(1):548-557.
APA	Liu, Jianghui,Liu, Junbo,Deng, Qingyuan,Feng, Jinhua,Zhou, Shaolin,&Hu, Song.(2020).Intensity modulation based optical proximity optimization for the maskless lithography.OPTICS EXPRESS,28(1),548-557.
MLA	Liu, Jianghui,et al."Intensity modulation based optical proximity optimization for the maskless lithography".OPTICS EXPRESS 28.1(2020):548-557.