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	Lithography apparatus, patterning device, and lithographic method
	DE JAGER, PIETER WILLEM HERMAN; VAN DER WERF, ROBERT ALBERTUS JOHANNES
	2016-09-15
著作权人	ASML NETHERLANDS B.V.
专利号	US20160266498A1
国家	美国
文献子类	发明申请
其他题名	Lithography apparatus, patterning device, and lithographic method
英文摘要	An exposure apparatus including: a substrate holder constructed to hold a substrate; a modulator, including a plurality of VECSELs or VCSELs to emit electromagnetic radiation, configured to expose an exposure area of a target portion to a plurality of beams of the radiation modulated according to a desired pattern, and a projection system configured to project the modulated beams onto the target portion and having an array of optical elements to receive the plurality of beams, the projection system configured to move the array of optical elements with respect to the plurality of VECSELs or VCSELs during exposure of the exposure area, wherein the movement involves rotation and/or the movement causes the beams to displace.
公开日期	2016-09-15
申请日期	2014-10-10
状态	失效
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/92794]
专题	半导体激光器专利数据库
作者单位	ASML NETHERLANDS B.V.
推荐引用方式 GB/T 7714	DE JAGER, PIETER WILLEM HERMAN,VAN DER WERF, ROBERT ALBERTUS JOHANNES. Lithography apparatus, patterning device, and lithographic method. US20160266498A1. 2016-09-15.

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