Double heterojunction type semiconductor laser
SAKAMOTO MASAMICHI; KAISE KIKUO
1988-02-17
著作权人SONY CORP
专利号JP1988036590A
国家日本
文献子类发明申请
其他题名Double heterojunction type semiconductor laser
英文摘要PURPOSE:To implement simplification in manufacturing, stabilization of characteristics, improvement of reliability and the like and to improve astigmatism and a threshold current value, by providing one step part on a substrate, and providing the thickness of a clad layer on the substrate side so that light in an active layer is hardly absorbed by the substrate in the entire region. CONSTITUTION:One step part 21 is formed on a semiconductor substrate A first clad layer 2 is formed on a semiconductor substrate 1 having said step part 2 The thickness of the layer 2 is made to have a value so that light loss is hardly yielded by absorption of the light when the light from an active layer 3 reaches the semiconductor substrate 1 in the entire region. For example, the first clad layer 2 comprising n-type Al0.45Ga0.55As is formed to a thickness of about 5 mum on the n-type GaAs single crystal substrate 1, on which the step part 21 is formed. An active layer 3 of Al0.10Ga0.90As is formed to a thickness of 500Angstrom the layer 3, p-type Al0.45Ga0.55As is formed to a thickness of about 5mum. An n-type GaAs cap layer 6 is further formed to a thickness of about 0.5mum. Then, p-type impurity Zn is selectively diffused or ions are implanted, and a current conducting region 22 is formed.
公开日期1988-02-17
申请日期1986-07-31
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/89681]  
专题半导体激光器专利数据库
作者单位SONY CORP
推荐引用方式
GB/T 7714
SAKAMOTO MASAMICHI,KAISE KIKUO. Double heterojunction type semiconductor laser. JP1988036590A. 1988-02-17.
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