Controllable etching-induced contact enhancement for high-performance carbon nanotube thin-film transistors
Lv, Zhengxia; Liu, Dan; Yu, Xiaoqin; Lv, Qianjin; Gao, Bing; Jin, Hehua; Qiu, Song; Men, Chuanling; Song, Qijun; Li, Qingwen
刊名RSC ADVANCES
2019
卷号9期号:19页码:10578
ISSN号2046-2069
DOI10.1039/c9ra01052a
文献子类Article
英文摘要Semiconducting single-walled carbon nanotubes (s-SWNTs) show great promises in advanced electronics. However, contact resistance between the nanotubes and metal electrode has long been a bottleneck to the development of s-SWNTs in high-performance electronic devices. Here we demonstrate a simple and controllable strategy for enhancing the electrode contact and therefore the performance of s-SWNT thin film transistors by plasma etching treatment, which effectively removes the polymer residues, including the photoresist and the conjugated molecules, adsorbed on the surface of s-SWNTs. As a result, the contact resistance is reduced by 3 times and the carrier mobility rises by up to 70%. Our method is compatible with current silicon semiconductor processing technology, making it a viable effective approach to large-scale application of s-SWNTs in the electronics industry.
WOS研究方向Chemistry
语种英语
出版者ROYAL SOC CHEMISTRY
内容类型期刊论文
源URL[http://ir.sic.ac.cn/handle/331005/27416]  
专题中国科学院上海硅酸盐研究所
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GB/T 7714
Lv, Zhengxia,Liu, Dan,Yu, Xiaoqin,et al. Controllable etching-induced contact enhancement for high-performance carbon nanotube thin-film transistors[J]. RSC ADVANCES,2019,9(19):10578.
APA Lv, Zhengxia.,Liu, Dan.,Yu, Xiaoqin.,Lv, Qianjin.,Gao, Bing.,...&Li, Qingwen.(2019).Controllable etching-induced contact enhancement for high-performance carbon nanotube thin-film transistors.RSC ADVANCES,9(19),10578.
MLA Lv, Zhengxia,et al."Controllable etching-induced contact enhancement for high-performance carbon nanotube thin-film transistors".RSC ADVANCES 9.19(2019):10578.
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