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	Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)]
	Huttunen-Saarivirta, E.; Rajala, P.; Carpen, L.; Wang, J.; Liu, F.; Ghanbari, E.; Mao, F.; Dong, C.; Yang, J.; Sarifi-Asl, S.
刊名	JOURNAL OF THE ELECTROCHEMICAL SOCIETY
	2019
卷号	166期号:10页码:Y17-Y26
关键词	POINT-DEFECT MODEL CARBON-STEEL CORROSION CHLORIDE SULFIDE GROWTH BREAKDOWN
DOI	10.1149/2.0771910jes
英文摘要	Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)]
内容类型	期刊论文
源URL	[http://ir.nimte.ac.cn/handle/174433/18231]
专题	2019专题
作者单位	Macdonald, DD (reprint author), Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94709 USA.
推荐引用方式 GB/T 7714	Huttunen-Saarivirta, E.,Rajala, P.,Carpen, L.,et al. Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)][J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY,2019,166(10):Y17-Y26.
APA	Huttunen-Saarivirta, E..,Rajala, P..,Carpen, L..,Wang, J..,Liu, F..,...&Macdonald, D. D..(2019).Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)].JOURNAL OF THE ELECTROCHEMICAL SOCIETY,166(10),Y17-Y26.
MLA	Huttunen-Saarivirta, E.,et al."Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)]".JOURNAL OF THE ELECTROCHEMICAL SOCIETY 166.10(2019):Y17-Y26.

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