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	Surface defect inspection with large particle monitoring and laser power control
	CUI, STEVE YIFENG; HUANG, JAY (CHUNSHENG); WANG, CHUNHAI; WOLTERS, CHRISTIAN; WHITESIDE, BRET; ROMANOVSKY, ANATOLY; HUANG, CHUANYONG; PETTIBONE, DONALD
	2018-02-08
著作权人	KLA-TENCOR CORPORATION
专利号	WO2018027010A1
国家	世界知识产权组织
文献子类	发明申请
其他题名	Surface defect inspection with large particle monitoring and laser power control
英文摘要	Methods and systems for reducing illumination intensity while scanning over large particles are presented herein. A surface inspection system determines the presence of a large particle in the inspection path of a primary measurement spot using a separate leading measurement spot. The inspection system reduces the incident illumination power while the large particle is within the primary measurement spot. The primary measurement spot and the leading measurement spot are separately imaged by a common imaging collection objective onto one or more detectors. The imaging based collection design spatially separates the image of the leading measurement spot from the image of the primary measurement spot at one or more wafer image planes. Light detected from the leading measurement spot is analyzed to determine a reduced power time interval when the optical power of the primary illumination beam and the leading illumination beam are reduced.
公开日期	2018-02-08
申请日期	2017-08-03
状态	未确认
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/62573]
专题	半导体激光器专利数据库
作者单位	KLA-TENCOR CORPORATION
推荐引用方式 GB/T 7714	CUI, STEVE YIFENG,HUANG, JAY ,WANG, CHUNHAI,et al. Surface defect inspection with large particle monitoring and laser power control. WO2018027010A1. 2018-02-08.

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