Process for obtaining ultra-low reflectivity facets for electro-absorption modulated lasers | |
PARAYANTHAL, PADMAN | |
2003-04-01 | |
著作权人 | QORVO US, INC. |
专利号 | US6542533 |
国家 | 美国 |
文献子类 | 授权发明 |
其他题名 | Process for obtaining ultra-low reflectivity facets for electro-absorption modulated lasers |
英文摘要 | An electro-absorption modulated laser is provided having three sections, a laser section, an isolation section, and a modulation section. The laser section produces light along a straight waveguide path. The modulation section also has a straight waveguide path, but is angled with respect to the laser section's path. The isolation section between the other two sections includes a path that is collinear with the respective laser or modulation section at each end, but is gradually curved in the middle. |
公开日期 | 2003-04-01 |
申请日期 | 2000-04-10 |
状态 | 授权 |
内容类型 | 专利 |
源URL | [http://ir.opt.ac.cn/handle/181661/44617] |
专题 | 半导体激光器专利数据库 |
作者单位 | QORVO US, INC. |
推荐引用方式 GB/T 7714 | PARAYANTHAL, PADMAN. Process for obtaining ultra-low reflectivity facets for electro-absorption modulated lasers. US6542533. 2003-04-01. |
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