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	Method for fabricating optical devices with defectless and antireflecting spot size converter
	KIM, SUNG BOCK; OH, DAE KON
著作权人	ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
专利号	US20020151095A1
国家	美国
文献子类	发明申请
其他题名	Method for fabricating optical devices with defectless and antireflecting spot size converter
英文摘要	The present invention relates to a method for fabricating an optical device integrated with a spot size converter to reduce defect and low reflectivity in a butt-joint portion, the method including the steps of: a) depositing a first clad layer, an active layer and a second clad layer sequentially on the (100) plane of a semiconductor substrate; b) forming on the second clad layer a double dielectric mask of which the lower layer has a relatively wider width than that of the upper layer, exposing one side of the second clad layer; c) wet-etching the first clad layer, the active layer and the second clad layer in a buried ridge structure by using the double dielectric mask, and exposing the (111)A plane of the active layer tilted towards the (100) plane by a predetermined angle; d) growing a spot size conversion region on the (111)A plane of the active layer; and e) removing the double dielectric mask.
公开日期	2002-10-17
申请日期	2002-03-04
状态	失效
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/43426]
专题	半导体激光器专利数据库
作者单位	ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
推荐引用方式 GB/T 7714	KIM, SUNG BOCK,OH, DAE KON. Method for fabricating optical devices with defectless and antireflecting spot size converter. US20020151095A1.

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