Optimization of microstructure and optical properties of VO2 thin film prepared by reactive sputtering

	Optimization of microstructure and optical properties of VO2 thin film prepared by reactive sputtering
	Y. Y. Luo ; L. Q. Zhu ; Y. X. Zhang ; S. S. Pan ; S. C. Xu ; M. Liu ; G. H. Li
刊名	journal of applied physics
	2013
卷号	113
学科主题	纳米材料与技术
公开日期	2013-08-16
内容类型	期刊论文
源URL	[http://ir.hfcas.ac.cn/handle/334002/10341]
专题	合肥物质科学研究院_中科院固体物理研究所
推荐引用方式 GB/T 7714	Y. Y. Luo,L. Q. Zhu,Y. X. Zhang,et al. Optimization of microstructure and optical properties of VO2 thin film prepared by reactive sputtering[J]. journal of applied physics,2013,113.
APA	Y. Y. Luo.,L. Q. Zhu.,Y. X. Zhang.,S. S. Pan.,S. C. Xu.,...&G. H. Li.(2013).Optimization of microstructure and optical properties of VO2 thin film prepared by reactive sputtering.journal of applied physics,113.
MLA	Y. Y. Luo,et al."Optimization of microstructure and optical properties of VO2 thin film prepared by reactive sputtering".journal of applied physics 113(2013).