Effect of ion-induced damage on GaNAs/GaAs quantum wells grown by plasma-assisted molecular beam epitaxy
Li LH ; Pan Z ; Zhang W ; Lin YW ; Wang XY ; Wu RH ; Ge WK
刊名journal of crystal growth
2001
卷号223期号:1-2页码:140-144
关键词molecular beam epitaxy quantum wells BAND-GAP ENERGY PHOTOLUMINESCENCE TEMPERATURE GANXAS1-X FILMS
ISSN号0022-0248
通讯作者li lh,chinese acad sci,inst semicond,state key lab integrated optoelect,pob 912,beijing 100083,peoples r china.
中文摘要the effect of ion-induced damage on ganas/gaas quantum wells (qws) grown by molecular beam epitaxy employing a dc plasma as the n source was investigated. ion-induced damage results in: (i) an observed disappearance of pendellosung fringes in the x-ray diffraction pattern of the sample; (ii) a drastic decrease in intensity and a broadening in the full-width at half-maximum of photoluminescence spectra. it was shown that ion-induced damage strongly affected the bandedge potential fluctuations of the qws. the bandedge potential fluctuations for the samples grown with and without ion removal magnets (irms) are 44 and 63 mev, respectively. it was found that the n-as atomic interdiffusion at the interfaces of the qws was enhanced by the ion damage-induced defects. the estimated activation energies of the n-as atomic interdiffusion for the samples grown with and without irms are 3.34 and 1.78 ev, respectively. (c) 2001 elsevier science b.v. all rights reserved.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-08-12
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/12276]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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GB/T 7714
Li LH,Pan Z,Zhang W,et al. Effect of ion-induced damage on GaNAs/GaAs quantum wells grown by plasma-assisted molecular beam epitaxy[J]. journal of crystal growth,2001,223(1-2):140-144.
APA Li LH.,Pan Z.,Zhang W.,Lin YW.,Wang XY.,...&Ge WK.(2001).Effect of ion-induced damage on GaNAs/GaAs quantum wells grown by plasma-assisted molecular beam epitaxy.journal of crystal growth,223(1-2),140-144.
MLA Li LH,et al."Effect of ion-induced damage on GaNAs/GaAs quantum wells grown by plasma-assisted molecular beam epitaxy".journal of crystal growth 223.1-2(2001):140-144.
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