Capacitance-voltage characteristic as a trace of the exciton evolvement from spatially direct to indirect in quantum wells | |
Tan PH | |
刊名 | semiconductor science and technology |
2001 | |
卷号 | 16期号:10页码:822-825 |
关键词 | RESONANT-TUNNELING DIODES DOTS HOLES |
ISSN号 | 0268-1242 |
通讯作者 | tang y,chinese acad sci,inst semicond,natl lab superlattices & microstruct,pob 912,beijing 100083,peoples r china. |
中文摘要 | we have investigated the photo-excited capacitance-voltage (c-v) characteristics as well as the photoluminescence spectra under different biases of a wide quantum well (qw) embedded in an n(+)-i-n(+) double-barrier structure. the pronounced peak feature at zero bias in the c-v spectrum observed upon illumination is regarded as a kind of quantum capacitance related to the quantum confined stark effect, originating from the spatial separation of the photo-generated electron and hole gas in the qw. this fact is further demonstrated through the comparison between the c-v curve with the pl intensity versus applied voltage relationship under the same excitation. the results may provide us with a more direct and sensitive means in the detection of the separation and accumulation of both types of free carriers-electrons and holes-in low-dimensional semiconductor structures, especially in a new type of optical memory cell. |
学科主题 | 半导体材料 |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2010-08-12 |
内容类型 | 期刊论文 |
源URL | [http://ir.semi.ac.cn/handle/172111/12078] |
专题 | 半导体研究所_中国科学院半导体研究所(2009年前) |
推荐引用方式 GB/T 7714 | Tan PH. Capacitance-voltage characteristic as a trace of the exciton evolvement from spatially direct to indirect in quantum wells[J]. semiconductor science and technology,2001,16(10):822-825. |
APA | Tan PH.(2001).Capacitance-voltage characteristic as a trace of the exciton evolvement from spatially direct to indirect in quantum wells.semiconductor science and technology,16(10),822-825. |
MLA | Tan PH."Capacitance-voltage characteristic as a trace of the exciton evolvement from spatially direct to indirect in quantum wells".semiconductor science and technology 16.10(2001):822-825. |
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