Abatement of waste gases and water during the processes of semiconductor fabrication

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	Abatement of waste gases and water during the processes of semiconductor fabrication
	Wen RM ; Liang JW
刊名	journal of environmental sciences-china
	2002
卷号	14 期号:4 页码:482-488
关键词	waste gases waste water abatement pollutant semiconductor TRACE
ISSN号	1001-0742
通讯作者	liang jw,chinese acad sci,inst semicond,beijing 100083,peoples r china.
中文摘要	the purpose of this article is to examine the methods and equipment for abating waste gases and water produced during the manufacture of semiconductor materials and devices. three separating methods and equipment are used to control three different groups of electronic wastes. the first group includes arsine and phosphine emitted during the processes of semiconductor materials manufacture. the abatement procedure for this group of pollutants consists of adding iodates, cupric and manganese salts to a multiple shower tower (mst) structure. the second group includes pollutants containing arsenic, phosphorus, hf, hcl, no2, and so3 emitted during the manufacture of semiconductor materials and devices. the abatement procedure involves mixing oxidants and bases in an oval column with a separator in the middle. the third group consists of the ions of as, p and heavy metals contained in the waste water. the abatement procedure includes adding caco3 and ferric salts in a flocculation-sedimentation compact device equipment. test results showed that all waste gases and water after the abatement procedures presented in this article passed the discharge standards set by the state environmental protection administration of china.
学科主题	半导体材料
收录类别	SCI
语种	英语
公开日期	2010-08-12
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/11758]
专题	半导体研究所_中国科学院半导体研究所（2009年前）
推荐引用方式 GB/T 7714	Wen RM,Liang JW. Abatement of waste gases and water during the processes of semiconductor fabrication[J]. journal of environmental sciences-china,2002,14(4):482-488.
APA	Wen RM,&Liang JW.(2002).Abatement of waste gases and water during the processes of semiconductor fabrication.journal of environmental sciences-china,14(4),482-488.
MLA	Wen RM,et al."Abatement of waste gases and water during the processes of semiconductor fabrication".journal of environmental sciences-china 14.4(2002):482-488.