Effect of growth conditions on the GaN thin film by sputtering deposition | |
Zhang CG ; Bian LF ; Chen WD ; Hsu CC | |
刊名 | journal of crystal growth |
2007 | |
卷号 | 299期号:2页码:268-271 |
关键词 | phase equilibria |
ISSN号 | issn: 0022-0248 |
通讯作者 | zhang, cg, chinese acad sci, inst semicond, state key lab surf phys, beijing 100083, peoples r china. 电子邮箱地址: zhangcg@semi.ac.cn |
中文摘要 | the phase transition between thermodynamically stable hexagonal wurtzite (h-wz) gallium nitride (gan) and metastable cubic zinc-blende (c-zb) gan during growth by radio-frequency planar magnetron sputtering is studied. gan films grown on substrates with lower mismatches tend to have a h-wz structure, but when grown on substrates with higher mismatches, a c-zb structure is preferred. gan films grown under high nitrogen pressure also tend to have a h-wz structure, whereas a c-zb structure is preferred when grown under low nitrogen pressure. in addition, low target-power growth not only helps to improve hexagonal gan (h-gan) crystalline quality at high nitrogen pressure on low-mismatch substrates, but also enhances cubic gan (c-gan) quality at low nitrogen pressure on high-mismatch substrates. (c) 2007 elsevier b.v. all rights reserved. |
学科主题 | 半导体材料 |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2010-03-29 |
内容类型 | 期刊论文 |
源URL | [http://ir.semi.ac.cn/handle/172111/9570] |
专题 | 半导体研究所_中国科学院半导体研究所(2009年前) |
推荐引用方式 GB/T 7714 | Zhang CG,Bian LF,Chen WD,et al. Effect of growth conditions on the GaN thin film by sputtering deposition[J]. journal of crystal growth,2007,299(2):268-271. |
APA | Zhang CG,Bian LF,Chen WD,&Hsu CC.(2007).Effect of growth conditions on the GaN thin film by sputtering deposition.journal of crystal growth,299(2),268-271. |
MLA | Zhang CG,et al."Effect of growth conditions on the GaN thin film by sputtering deposition".journal of crystal growth 299.2(2007):268-271. |
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