Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition

	Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition
	Jin, CG ; Yu, T ; Bo, Y ; Zhao, Y ; Zhang, HY ; Dong, YJ ; Wu, XM ; Zhuge, LJ ; Ge, SB
刊名	VACUUM
	2012
卷号	86 期号:8 页码:1078-1082
关键词	Materials Science Physics Multidisciplinary Applied
ISSN号	0042-207X
学科主题	Materials Science; Physics
收录类别	SCI
原文出处	10.1016/j.vacuum.2011.10.001
语种	英语
公开日期	2013-05-10
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/115293]
专题	上海微系统与信息技术研究所_信息功能材料国家重点实验室2008-2012_期刊论文
推荐引用方式 GB/T 7714	Jin, CG,Yu, T,Bo, Y,et al. Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition[J]. VACUUM,2012,86(8):1078-1082.
APA	Jin, CG.,Yu, T.,Bo, Y.,Zhao, Y.,Zhang, HY.,...&Ge, SB.(2012).Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition.VACUUM,86(8),1078-1082.
MLA	Jin, CG,et al."Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition".VACUUM 86.8(2012):1078-1082.