Improvement of the performance of GaN-based LEDs grown on sapphire substrates patterned by wet and ICP etching
Gao, HY ; Yan, FW ; Zhang, Y ; Li, JM ; Zeng, YP ; Wang, GH
刊名solid-state electronics
2008
卷号52期号:6页码:962-967
关键词InGaN/GaN multiple quantum wells light-emitting diode wet etching inductively coupled plasma etching
ISSN号0038-1101
通讯作者gao, hy, chinese acad sci, inst semicond, semicond lighting technol res & dev ctr, beijing 100083, peoples r china. 电子邮箱地址: hygao@semi.ac.cn
中文摘要sapphire substrates patterned by a selective chemical wet and an inductively coupled plasma (icp) etching technique was proposed to improve the performance of gan-based light-emitting diodes (leds). gan-based leds were fabricated on sapphire substrates through metal organic chemical vapor deposition (mocvd). the leds fabricated on the patterned substrates exhibit improved device performance compared with the conventional led fabricated on planar substrates when growth and device fabricating conditions were the same. the light output powers of the leds fabricated on wet-patterned and icp-patterned substrates were about 37% and 17% higher than that of leds on planar substrates at an injection current of 20 ma, respectively. the enhancement is attributable to the combination of the improvement of gan-based epilayers quality and the improvement of the light extraction efficiency. (c) 2008 elsevier ltd. all rights reserved.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-03-08
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/6610]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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GB/T 7714
Gao, HY,Yan, FW,Zhang, Y,et al. Improvement of the performance of GaN-based LEDs grown on sapphire substrates patterned by wet and ICP etching[J]. solid-state electronics,2008,52(6):962-967.
APA Gao, HY,Yan, FW,Zhang, Y,Li, JM,Zeng, YP,&Wang, GH.(2008).Improvement of the performance of GaN-based LEDs grown on sapphire substrates patterned by wet and ICP etching.solid-state electronics,52(6),962-967.
MLA Gao, HY,et al."Improvement of the performance of GaN-based LEDs grown on sapphire substrates patterned by wet and ICP etching".solid-state electronics 52.6(2008):962-967.
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