Uncooled Thermoelectric Infrared Sensor With Advanced Micromachining

	Uncooled Thermoelectric Infrared Sensor With Advanced Micromachining
	Xu, DH ; Xiong, B ; Wu, GQ ; Ma, YL ; Wang, YL
刊名	IEEE SENSORS JOURNAL
	2012
卷号	12 期号:6 页码:-
关键词	Advanced micromachining microelectromechanical systems (MEMS) thermoelectric uncooled infrared sensor wet silicon etching XeF2 silicon etching
ISSN号	1530-437X
通讯作者	Xu, DH (reprint author), Chinese Acad Sci, Sci & Technol Microsyst Lab, State Key Lab Transducer Technol, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China.
中文摘要	A simple mass producible uncooled thermoelectric infrared microsensor has been designed and fabricated. To improve the cost-efficiency, an advanced micromachining process, which combines wet anisotropic pre-etching and XeF2 dry isotropic post-etching, is
学科主题	Engineering; Instruments & Instrumentation; Physics
收录类别	2012SCI-114
原文出处	10.1109/JSEN.2011.2181497
语种	英语
公开日期	2013-04-23
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/114916]
专题	上海微系统与信息技术研究所_微系统技术_期刊论文
推荐引用方式 GB/T 7714	Xu, DH,Xiong, B,Wu, GQ,et al. Uncooled Thermoelectric Infrared Sensor With Advanced Micromachining[J]. IEEE SENSORS JOURNAL,2012,12(6):-.
APA	Xu, DH,Xiong, B,Wu, GQ,Ma, YL,&Wang, YL.(2012).Uncooled Thermoelectric Infrared Sensor With Advanced Micromachining.IEEE SENSORS JOURNAL,12(6),-.
MLA	Xu, DH,et al."Uncooled Thermoelectric Infrared Sensor With Advanced Micromachining".IEEE SENSORS JOURNAL 12.6(2012):-.