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Analytical model of energy level alignment at metal-organic interface facilitating hole injection
Shi, Xuewen; Xu, Guangwei; Duan, Xinlv; Lu, Nianduan; Chen, Jiezhi; Li, Ling; Liu, Ming
2017
会议名称2017 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2017
会议日期7 September 2017 through 9 September 2017
关键词Electrostatic model Energy level alignment Exponential density of states Metal-organic interface
卷号2017-September
DOI10.23919/SISPAD.2017.8085305
页码225-228
收录类别EI ; SCOPUS
会议录International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
URL标识查看原文
内容类型会议论文
URI标识http://www.corc.org.cn/handle/1471x/6029539
专题山东大学
作者单位Key Laboratory of Microelectronic Device and Integrated Technology, Insti
推荐引用方式
GB/T 7714
Shi, Xuewen,Xu, Guangwei,Duan, Xinlv,et al. Analytical model of energy level alignment at metal-organic interface facilitating hole injection[C]. 见:2017 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2017. 7 September 2017 through 9 September 2017.
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