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Dynamic exposure model analysis of continuous laser direct writing in Polar-coordinate
Zhang, Shan; Lv, Yingjun; Mao, Wenjie
2018
会议名称2017 International Conference on Optical Instruments and Technology: Advanced Laser Technology and Applications, OIT 2017
会议日期October 28, 2017 - October 30, 2017
卷号10619
DOI10.1117/12.2295008
收录类别EI
会议录Proceedings of SPIE - The International Society for Optical Engineering
URL标识查看原文
内容类型会议论文
URI标识http://www.corc.org.cn/handle/1471x/6027098
专题山东大学
作者单位Department of Electrical Engineering and Information Technology, Shandong University of Science and Technolog
推荐引用方式
GB/T 7714
Zhang, Shan,Lv, Yingjun,Mao, Wenjie. Dynamic exposure model analysis of continuous laser direct writing in Polar-coordinate[C]. 见:2017 International Conference on Optical Instruments and Technology: Advanced Laser Technology and Applications, OIT 2017. October 28, 2017 - October 30, 2017.
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