Dynamic exposure model analysis of continuous laser direct writing in Polar-coordinate | |
Zhang, Shan; Lv, Yingjun; Mao, Wenjie | |
2018 | |
会议名称 | 2017 International Conference on Optical Instruments and Technology: Advanced Laser Technology and Applications, OIT 2017 |
会议日期 | October 28, 2017 - October 30, 2017 |
卷号 | 10619 |
DOI | 10.1117/12.2295008 |
收录类别 | EI |
会议录 | Proceedings of SPIE - The International Society for Optical Engineering |
URL标识 | 查看原文 |
内容类型 | 会议论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/6027098 |
专题 | 山东大学 |
作者单位 | Department of Electrical Engineering and Information Technology, Shandong University of Science and Technolog |
推荐引用方式 GB/T 7714 | Zhang, Shan,Lv, Yingjun,Mao, Wenjie. Dynamic exposure model analysis of continuous laser direct writing in Polar-coordinate[C]. 见:2017 International Conference on Optical Instruments and Technology: Advanced Laser Technology and Applications, OIT 2017. October 28, 2017 - October 30, 2017. |
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