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	Effect of incident intensity on films growth in pulsed laser deposition
	Guan Li[1]; Zhang Duan-Ming[2]; Li Zhi-Hua[3]; Tan Xin-Yu[4]; Li Li[5]; Liu Dan[6]; Fang Ran-Ran[7]; Liu Gao-Bin[8]; Hu De-Zhi[9]
刊名	CHINESE PHYSICS LETTERS
	2006
卷号	23期号:8页码:2277-2280
ISSN号	0256-307X
URL标识	查看原文
收录类别	SCI(E)
WOS记录号	WOS:000239365500086
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5983154
专题	河北大学
作者单位	1.Huazhong Univ Sci & Technol, Dept Phys, Wuhan 430074, Peoples R China. 2.Hebei Univ, Coll Phys Sci & Technol, Baoding 071002, Peoples R China.
推荐引用方式 GB/T 7714	Guan Li[1],Zhang Duan-Ming[2],Li Zhi-Hua[3],et al. Effect of incident intensity on films growth in pulsed laser deposition[J]. CHINESE PHYSICS LETTERS,2006,23(8):2277-2280.
APA	Guan Li[1].,Zhang Duan-Ming[2].,Li Zhi-Hua[3].,Tan Xin-Yu[4].,Li Li[5].,...&Hu De-Zhi[9].(2006).Effect of incident intensity on films growth in pulsed laser deposition.CHINESE PHYSICS LETTERS,23(8),2277-2280.
MLA	Guan Li[1],et al."Effect of incident intensity on films growth in pulsed laser deposition".CHINESE PHYSICS LETTERS 23.8(2006):2277-2280.

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