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	Atomic oxygen irradiation resistance of transparent conductive oxide thin films
	Ouyang, Qi; Wang, Wenwen; Fu, Qiang; Dong, Dongmei
刊名	THIN SOLID FILMS
	2017
卷号	623页码:31-39
关键词	Tungsten-doped indium oxide thin films Tin-doped indium oxide thin films Radio frequency reactive magnetron sputtering Atomic oxygen irradiation Optical and electrical properties
ISSN号	0040-6090
DOI	10.1016/j.tsf.2016.12.038
URL标识	查看原文
收录类别	SCIE ; EI
WOS记录号	WOS:000394191300006
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5942043
专题	北京航空航天大学
推荐引用方式 GB/T 7714	Ouyang, Qi,Wang, Wenwen,Fu, Qiang,et al. Atomic oxygen irradiation resistance of transparent conductive oxide thin films[J]. THIN SOLID FILMS,2017,623:31-39.
APA	Ouyang, Qi,Wang, Wenwen,Fu, Qiang,&Dong, Dongmei.(2017).Atomic oxygen irradiation resistance of transparent conductive oxide thin films.THIN SOLID FILMS,623,31-39.
MLA	Ouyang, Qi,et al."Atomic oxygen irradiation resistance of transparent conductive oxide thin films".THIN SOLID FILMS 623(2017):31-39.

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