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	Effect of aluminum incorporation on the microstructure and electrical properties of Cu(InGaAl)Se-2 targets
	Ma, Qiang; Zhang, Weijia; Ma, Denghao; Jiang, Zhaoyi; Wang, Shan; Xi, Yilian; Fan, Zhiqiang; Zhang, Yulong; Lu, Chaoqun
刊名	JOURNAL OF ALLOYS AND COMPOUNDS
	2018
卷号	737页码:160-166
关键词	ClGAS Target Density Microstructure Electrical properties
ISSN号	0925-8388
DOI	10.1016/j.jallcom.2017.12.082
URL标识	查看原文
收录类别	SCIE ; EI
WOS记录号	WOS:000419212900021
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5936114
专题	北京航空航天大学
推荐引用方式 GB/T 7714	Ma, Qiang,Zhang, Weijia,Ma, Denghao,et al. Effect of aluminum incorporation on the microstructure and electrical properties of Cu(InGaAl)Se-2 targets[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2018,737:160-166.
APA	Ma, Qiang.,Zhang, Weijia.,Ma, Denghao.,Jiang, Zhaoyi.,Wang, Shan.,...&Lu, Chaoqun.(2018).Effect of aluminum incorporation on the microstructure and electrical properties of Cu(InGaAl)Se-2 targets.JOURNAL OF ALLOYS AND COMPOUNDS,737,160-166.
MLA	Ma, Qiang,et al."Effect of aluminum incorporation on the microstructure and electrical properties of Cu(InGaAl)Se-2 targets".JOURNAL OF ALLOYS AND COMPOUNDS 737(2018):160-166.

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