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	Surface Topography and Deuterium Retention of Polycrystalline Tungsten and Nanocrystalline Tungsten Film Exposed to Deuterium Plasma
	Yu, Jiangang; Han, Wenjia; Lian, Ziwei; Zhu, Kaigui
刊名	FUSION SCIENCE AND TECHNOLOGY
	2018
卷号	73页码:5-12
关键词	Magnetron sputtering nanocrystalline tungsten film blister
ISSN号	1536-1055
DOI	10.1080/15361055.2017.1372680
URL标识	查看原文
收录类别	SCIE ; EI
WOS记录号	WOS:000428284900002
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5935967
专题	北京航空航天大学
推荐引用方式 GB/T 7714	Yu, Jiangang,Han, Wenjia,Lian, Ziwei,et al. Surface Topography and Deuterium Retention of Polycrystalline Tungsten and Nanocrystalline Tungsten Film Exposed to Deuterium Plasma[J]. FUSION SCIENCE AND TECHNOLOGY,2018,73:5-12.
APA	Yu, Jiangang,Han, Wenjia,Lian, Ziwei,&Zhu, Kaigui.(2018).Surface Topography and Deuterium Retention of Polycrystalline Tungsten and Nanocrystalline Tungsten Film Exposed to Deuterium Plasma.FUSION SCIENCE AND TECHNOLOGY,73,5-12.
MLA	Yu, Jiangang,et al."Surface Topography and Deuterium Retention of Polycrystalline Tungsten and Nanocrystalline Tungsten Film Exposed to Deuterium Plasma".FUSION SCIENCE AND TECHNOLOGY 73(2018):5-12.

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