Effect of High-Temperature Pregrowth Treatment on the Surface Morphology of GaInP Epilayers on Ge Grown by Metal-Organic Vapor-Phase Epitaxy
He, W ; Lu, SL ; Dong, JR ; Zhao, YM ; Yang, H
刊名japanese journal of applied physics
2012
卷号51期号:1,part 1页码:15501
学科主题半导体物理
收录类别SCI
语种英语
公开日期2013-03-20
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/23746]  
专题半导体研究所_半导体超晶格国家重点实验室
推荐引用方式
GB/T 7714
He, W,Lu, SL,Dong, JR,et al. Effect of High-Temperature Pregrowth Treatment on the Surface Morphology of GaInP Epilayers on Ge Grown by Metal-Organic Vapor-Phase Epitaxy[J]. japanese journal of applied physics,2012,51(1,part 1):15501.
APA He, W,Lu, SL,Dong, JR,Zhao, YM,&Yang, H.(2012).Effect of High-Temperature Pregrowth Treatment on the Surface Morphology of GaInP Epilayers on Ge Grown by Metal-Organic Vapor-Phase Epitaxy.japanese journal of applied physics,51(1,part 1),15501.
MLA He, W,et al."Effect of High-Temperature Pregrowth Treatment on the Surface Morphology of GaInP Epilayers on Ge Grown by Metal-Organic Vapor-Phase Epitaxy".japanese journal of applied physics 51.1,part 1(2012):15501.
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