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	Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias
	Viloan, Rommel Paulo B.; Gu, Jiabin; Boyd, Robert; Keraudyd, Julien; Li, Liuhe; Helmersson, Ulf
刊名	THIN SOLID FILMS
	2019
卷号	688
关键词	High power impulse magnetron sputtering Bipolar HiPIMS Ion energy distribution function tuning Titanium nitride
ISSN号	0040-6090
DOI	10.1016/j.tsf.2019.05.069
URL标识	查看原文
收录类别	SCIE ; EI
WOS记录号	WOS:000485256500006
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5915940
专题	北京航空航天大学
推荐引用方式 GB/T 7714	Viloan, Rommel Paulo B.,Gu, Jiabin,Boyd, Robert,et al. Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias[J]. THIN SOLID FILMS,2019,688.
APA	Viloan, Rommel Paulo B.,Gu, Jiabin,Boyd, Robert,Keraudyd, Julien,Li, Liuhe,&Helmersson, Ulf.(2019).Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias.THIN SOLID FILMS,688.
MLA	Viloan, Rommel Paulo B.,et al."Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias".THIN SOLID FILMS 688(2019).

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