Comparison of the chemical composition of boron-doped diamond surfaces upon different oxidation processes | |
Mei Wang; Nathalie Simon; Claudia Decorse-Pascanut; Muriel Bouttemy; Arnaud Etcheberry; Musen Li; Rabah Boukherroub; Sabine Szunerits | |
刊名 | Electrochimica Acta
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2009 | |
卷号 | 54期号:24页码:5818-5824 |
关键词 | Diamond Oxidation Surface chemistry Mott-Schottky XPS |
DOI | 10.1016/j.electacta.2009.05.037 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5539910 |
专题 | 山东大学 |
作者单位 | Institut de Recherche Interdisciplinaire, IRI, USR CNRS-3078, Institut d'Electronique, de Microélectronique et de Nanotechnologie, Avenue Po |
推荐引用方式 GB/T 7714 | Mei Wang,Nathalie Simon,Claudia Decorse-Pascanut,et al. Comparison of the chemical composition of boron-doped diamond surfaces upon different oxidation processes[J]. Electrochimica Acta,2009,54(24):5818-5824. |
APA | Mei Wang.,Nathalie Simon.,Claudia Decorse-Pascanut.,Muriel Bouttemy.,Arnaud Etcheberry.,...&Sabine Szunerits.(2009).Comparison of the chemical composition of boron-doped diamond surfaces upon different oxidation processes.Electrochimica Acta,54(24),5818-5824. |
MLA | Mei Wang,et al."Comparison of the chemical composition of boron-doped diamond surfaces upon different oxidation processes".Electrochimica Acta 54.24(2009):5818-5824. |
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