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Comparison of the chemical composition of boron-doped diamond surfaces upon different oxidation processes
Mei Wang; Nathalie Simon; Claudia Decorse-Pascanut; Muriel Bouttemy; Arnaud Etcheberry; Musen Li; Rabah Boukherroub; Sabine Szunerits
刊名Electrochimica Acta
2009
卷号54期号:24页码:5818-5824
关键词Diamond Oxidation Surface chemistry Mott-Schottky XPS
DOI10.1016/j.electacta.2009.05.037
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/5539910
专题山东大学
作者单位Institut de Recherche Interdisciplinaire, IRI, USR CNRS-3078, Institut d'Electronique, de Microélectronique et de Nanotechnologie, Avenue Po
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GB/T 7714
Mei Wang,Nathalie Simon,Claudia Decorse-Pascanut,et al. Comparison of the chemical composition of boron-doped diamond surfaces upon different oxidation processes[J]. Electrochimica Acta,2009,54(24):5818-5824.
APA Mei Wang.,Nathalie Simon.,Claudia Decorse-Pascanut.,Muriel Bouttemy.,Arnaud Etcheberry.,...&Sabine Szunerits.(2009).Comparison of the chemical composition of boron-doped diamond surfaces upon different oxidation processes.Electrochimica Acta,54(24),5818-5824.
MLA Mei Wang,et al."Comparison of the chemical composition of boron-doped diamond surfaces upon different oxidation processes".Electrochimica Acta 54.24(2009):5818-5824.
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