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	Effect of Chelating Agent and Surfactant on TaN CMP in Weakly Alkaline Slurry
	Xiao, Yue; Pan, Guofeng; Tian, Qiyuan; He, Ping; Wang, Qingwei; Zheng, Jie; Wang, Chenwei
刊名	ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
	2018
卷号	Vol.7 No.11页码:P608-P614
ISSN号	2162-8769
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5464377
专题	湖南大学
作者单位	1.Hebei Univ Technol, Sch Elect & Informat Engn, Tianjin Key Lab Elect Mat & Devices, Tianjin 300130, Peoples R China 2.Hebei Univ Technol, Sch Comp Sci & Engn, Tianjin 300130, Peoples R China
推荐引用方式 GB/T 7714	Xiao, Yue,Pan, Guofeng,Tian, Qiyuan,et al. Effect of Chelating Agent and Surfactant on TaN CMP in Weakly Alkaline Slurry[J]. ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY,2018,Vol.7 No.11:P608-P614.
APA	Xiao, Yue.,Pan, Guofeng.,Tian, Qiyuan.,He, Ping.,Wang, Qingwei.,...&Wang, Chenwei.(2018).Effect of Chelating Agent and Surfactant on TaN CMP in Weakly Alkaline Slurry.ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY,Vol.7 No.11,P608-P614.
MLA	Xiao, Yue,et al."Effect of Chelating Agent and Surfactant on TaN CMP in Weakly Alkaline Slurry".ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY Vol.7 No.11(2018):P608-P614.

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