Electron attachment rate constant measurement by photoemission electron attachment ion mobility spectrometry(PE-EA-IMS

	Electron attachment rate constant measurement by photoemission electron attachment ion mobility spectrometry(PE-EA-IMS
	Desheng Su ; Wenqi Niu ; Sheng Liu ; Chengyin Shen ; Chaoqun Huang ; Hongmei Wang ; Haihe Jiang ; Yannan Chu
刊名	radiation physics and chemistry
	2012
卷号	81
学科主题	光谱分析与技术
公开日期	2013-01-11
内容类型	期刊论文
源URL	[http://ir.hfcas.ac.cn/handle/334002/9796]
专题	合肥物质科学研究院_中科院安徽光学精密机械研究所
推荐引用方式 GB/T 7714	Desheng Su,Wenqi Niu,Sheng Liu,et al. Electron attachment rate constant measurement by photoemission electron attachment ion mobility spectrometry(PE-EA-IMS[J]. radiation physics and chemistry,2012,81.
APA	Desheng Su.,Wenqi Niu.,Sheng Liu.,Chengyin Shen.,Chaoqun Huang.,...&Yannan Chu.(2012).Electron attachment rate constant measurement by photoemission electron attachment ion mobility spectrometry(PE-EA-IMS.radiation physics and chemistry,81.
MLA	Desheng Su,et al."Electron attachment rate constant measurement by photoemission electron attachment ion mobility spectrometry(PE-EA-IMS".radiation physics and chemistry 81(2012).