Photonic quantum ring laser and fabrication method thereof
KWON, O DAE; SHIN, MI-HYANG; LEE, SEUNG EUN; JANG, YOUNG-HEUB; KIM, YOUNG CHUN; YOON, JUNHO
2013-08-20
著作权人POSTECH ACADEMY-INDUSTRY FOUNDATION
专利号US8513036
国家美国
文献子类授权发明
其他题名Photonic quantum ring laser and fabrication method thereof
英文摘要A photonic quantum ring (PQR) laser includes an active layer having a multi-quantum-well (MQW) structure and etched lateral face. The active layer is formed to be sandwiched between p-GaN and n-GaN layers epitaxially grown on a reflector disposed over a support substrate. A coating layer is formed over an outside of the lateral faces of the active layer, and upper electrode is electrically connected to an upper portion of the n-GaN layer, and a distributed Bragg reflector (DBR) is formed over the n-GaN layer and the upper electrode. Accordingly, the PQR laser is capable of oscillating a power-saving vertically dominant 3D multi-mode laser suitable for a low power display device, prevent the light speckle phenomenon, and generate focus-adjusted 3D soft light.
公开日期2013-08-20
申请日期2012-06-15
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/38606]  
专题半导体激光器专利数据库
作者单位POSTECH ACADEMY-INDUSTRY FOUNDATION
推荐引用方式
GB/T 7714
KWON, O DAE,SHIN, MI-HYANG,LEE, SEUNG EUN,et al. Photonic quantum ring laser and fabrication method thereof. US8513036. 2013-08-20.
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace