III-N device structures and methods
PARIKH, PRIMIT; DORA, YUVARAJ; WU, YIFENG; MISHRA, UMESH; FICHTENBAUM, NICHOLAS; LAL, RAKESH K.
2015-12-29
著作权人TRANSPHORM INC.
专利号US9224671
国家美国
文献子类授权发明
其他题名III-N device structures and methods
英文摘要A III-N device is described with a III-N layer, an electrode thereon, a passivation layer adjacent the III-N layer and electrode, a thick insulating layer adjacent the passivation layer and electrode, a high thermal conductivity carrier capable of transferring substantial heat away from the III-N device, and a bonding layer between the thick insulating layer and the carrier. The bonding layer attaches the thick insulating layer to the carrier. The thick insulating layer can have a precisely controlled thickness and be thermally conductive.
公开日期2015-12-29
申请日期2014-10-23
状态授权
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/37783]  
专题半导体激光器专利数据库
作者单位TRANSPHORM INC.
推荐引用方式
GB/T 7714
PARIKH, PRIMIT,DORA, YUVARAJ,WU, YIFENG,et al. III-N device structures and methods. US9224671. 2015-12-29.
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