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	Sensor for semiconductor device manufacturing process control
	MOSLEHI, MEHRDAD M.
	1994-03-08
著作权人	TEXAS INSTRUMENTS INCORPORATED, A CORP. OF DE
专利号	US5293216
国家	美国
文献子类	授权发明
其他题名	Sensor for semiconductor device manufacturing process control
英文摘要	A fiber-optic sensor device (210) for semiconductor device manufacturing process control measures polycrystalline film thickness as well as surface roughness and spectral emissivity of semiconductor wafer (124). The device (210) comprises a sensor arm (212) and an opto-electronic interface and measurement box (214), for directing coherent laser energy in the direction of semiconductor wafer (124). Opto-electronic interface/measurement unit (214) includes circuitry for measuring the amounts of laser power coherently reflected in the specular direction from the semiconductor wafer (124) surface, scatter reflected from the semiconductor wafer (124) surface, coherently transmitted in the specular direction through the semiconductor wafer (124), and scatter transmitted through the semiconductor wafer (124). The present invention determines the semiconductor wafer (124) surface roughness and spectral emissivity values using the measured optical powers of incident, specular reflected, scatter reflected, specular transmitted, and scatter transmitted beams.
公开日期	1994-03-08
申请日期	1990-12-31
状态	失效
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/34424]
专题	半导体激光器专利数据库
作者单位	TEXAS INSTRUMENTS INCORPORATED, A CORP. OF DE
推荐引用方式 GB/T 7714	MOSLEHI, MEHRDAD M.. Sensor for semiconductor device manufacturing process control. US5293216. 1994-03-08.

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