Laser polycrystallization apparatus | |
ASLANOV, EMIL; RYU, JEKIL; LEE, HAESOOK; HAN, GYOOWAN | |
2019-09-03 | |
著作权人 | SAMSUNG DISPLAY CO., LTD. |
专利号 | US10403499 |
国家 | 美国 |
文献子类 | 授权发明 |
其他题名 | Laser polycrystallization apparatus |
英文摘要 | A laser polycrystallization apparatus including: a light source for emitting a laser beam; a diffraction grating for receiving the laser beam from the light source, changing a path and a magnitude of the received laser beam, and outputting the changed laser beam; a light split portion for splitting the laser beam received from the diffraction grating; and a light superposition portion for superposing the split laser beams received from the light split portion and irradiating the superposed split laser beams to a substrate. An angle between the laser beam irradiated to an incidence surface of the diffraction grating from the light source and a line substantially perpendicular to an emission surface of the diffraction grating is an acute angle. |
公开日期 | 2019-09-03 |
申请日期 | 2017-12-20 |
状态 | 授权 |
内容类型 | 专利 |
源URL | [http://ir.opt.ac.cn/handle/181661/34371] |
专题 | 半导体激光器专利数据库 |
作者单位 | SAMSUNG DISPLAY CO., LTD. |
推荐引用方式 GB/T 7714 | ASLANOV, EMIL,RYU, JEKIL,LEE, HAESOOK,et al. Laser polycrystallization apparatus. US10403499. 2019-09-03. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论