Laser polycrystallization apparatus
ASLANOV, EMIL; RYU, JEKIL; LEE, HAESOOK; HAN, GYOOWAN
2019-09-03
著作权人SAMSUNG DISPLAY CO., LTD.
专利号US10403499
国家美国
文献子类授权发明
其他题名Laser polycrystallization apparatus
英文摘要A laser polycrystallization apparatus including: a light source for emitting a laser beam; a diffraction grating for receiving the laser beam from the light source, changing a path and a magnitude of the received laser beam, and outputting the changed laser beam; a light split portion for splitting the laser beam received from the diffraction grating; and a light superposition portion for superposing the split laser beams received from the light split portion and irradiating the superposed split laser beams to a substrate. An angle between the laser beam irradiated to an incidence surface of the diffraction grating from the light source and a line substantially perpendicular to an emission surface of the diffraction grating is an acute angle.
公开日期2019-09-03
申请日期2017-12-20
状态授权
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/34371]  
专题半导体激光器专利数据库
作者单位SAMSUNG DISPLAY CO., LTD.
推荐引用方式
GB/T 7714
ASLANOV, EMIL,RYU, JEKIL,LEE, HAESOOK,et al. Laser polycrystallization apparatus. US10403499. 2019-09-03.
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