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	Method for producing quantum cascade laser and quantum cascade laser
	TSUJI, YUKIHIRO
	2018-04-10
著作权人	SUMITOMO ELECTRIC INDUSTRIES, LTD.
专利号	US9941666
国家	美国
文献子类	授权发明
其他题名	Method for producing quantum cascade laser and quantum cascade laser
英文摘要	A method for producing a quantum cascade laser includes the steps of forming a laser structure including a mesa structure and a buried region embedding the mesa structure; forming a mask on the laser structure, the mask including a first pattern that defines a λ/4 period distribution Bragg reflector structure and a second pattern that defines a 3λ/4 period distribution Bragg reflector structure; and forming a first distribution Bragg reflector structure, a second distribution Bragg reflector structure, and a semiconductor waveguide structure by dry-etching the laser structure through the mask, the semiconductor waveguide structure including the mesa structure that has first and second end facets. The first distribution Bragg reflector structure is optically coupled to the first end facet. The second distribution Bragg reflector structure is optically coupled to the second end facet. Here, λ denotes a value of an oscillation wavelength of the quantum cascade laser in vacuum.
公开日期	2018-04-10
申请日期	2016-12-07
状态	授权
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/32327]
专题	半导体激光器专利数据库
作者单位	SUMITOMO ELECTRIC INDUSTRIES, LTD.
推荐引用方式 GB/T 7714	TSUJI, YUKIHIRO. Method for producing quantum cascade laser and quantum cascade laser. US9941666. 2018-04-10.

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