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Characteristics of plasma immersion ion implantation with a nanosecond rise-time pulse: particle-in-cell simulations
Sun, Jizhong; Sang, Chaofeng; Stirner, Thomas; Wang, Dezhen
刊名JOURNAL OF PHYSICS D-APPLIED PHYSICS
2010
卷号43
ISSN号0022-3727
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/5267725
专题大连理工大学
作者单位1.Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China.
2.Univ Appl Sci Deggendorf, Dept Elect Engn, D-94469 Deggendorf, Germany.
推荐引用方式
GB/T 7714
Sun, Jizhong,Sang, Chaofeng,Stirner, Thomas,et al. Characteristics of plasma immersion ion implantation with a nanosecond rise-time pulse: particle-in-cell simulations[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2010,43.
APA Sun, Jizhong,Sang, Chaofeng,Stirner, Thomas,&Wang, Dezhen.(2010).Characteristics of plasma immersion ion implantation with a nanosecond rise-time pulse: particle-in-cell simulations.JOURNAL OF PHYSICS D-APPLIED PHYSICS,43.
MLA Sun, Jizhong,et al."Characteristics of plasma immersion ion implantation with a nanosecond rise-time pulse: particle-in-cell simulations".JOURNAL OF PHYSICS D-APPLIED PHYSICS 43(2010).
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