Characteristics of plasma immersion ion implantation with a nanosecond rise-time pulse: particle-in-cell simulations | |
Sun, Jizhong; Sang, Chaofeng; Stirner, Thomas; Wang, Dezhen | |
刊名 | JOURNAL OF PHYSICS D-APPLIED PHYSICS |
2010 | |
卷号 | 43 |
ISSN号 | 0022-3727 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5267725 |
专题 | 大连理工大学 |
作者单位 | 1.Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China. 2.Univ Appl Sci Deggendorf, Dept Elect Engn, D-94469 Deggendorf, Germany. |
推荐引用方式 GB/T 7714 | Sun, Jizhong,Sang, Chaofeng,Stirner, Thomas,et al. Characteristics of plasma immersion ion implantation with a nanosecond rise-time pulse: particle-in-cell simulations[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2010,43. |
APA | Sun, Jizhong,Sang, Chaofeng,Stirner, Thomas,&Wang, Dezhen.(2010).Characteristics of plasma immersion ion implantation with a nanosecond rise-time pulse: particle-in-cell simulations.JOURNAL OF PHYSICS D-APPLIED PHYSICS,43. |
MLA | Sun, Jizhong,et al."Characteristics of plasma immersion ion implantation with a nanosecond rise-time pulse: particle-in-cell simulations".JOURNAL OF PHYSICS D-APPLIED PHYSICS 43(2010). |
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