Structure and characteristics of amorphous (Ti,Si)–C:H ﬁlms deposited by reactive magnetron sputtering

CORC > 兰州化学物理研究所 > 中国科学院兰州化学物理研究所 > 固体润滑国家重点实验室

	Structure and characteristics of amorphous (Ti,Si)–C:H ﬁlms deposited by reactive magnetron sputtering
	Wang P(王鹏); Hao JY(郝俊英); Liu WM(刘维民)
刊名	Diamond and Related Materials
	2010
卷号	19 页码:1172-1177
关键词	Amorphous hydrogenated carbon Doping Microstructure Superlow friction
ISSN号	0925-9635
通讯作者	刘维民
中文摘要	The hydrogenated amorphous carbon ﬁlms doped with Ti and Si ((Ti,Si)–C:H) were deposited on siliconsubstrates using reactive magnetron sputtering Ti80Si20 composite target in an argon and methane gasmixture. The structures of the ﬁlms were analyzed by X-ray photoelectron spectroscopy and Visible Ramanspectroscopy. The morphologies were observed by atomic force microscope. The friction coefﬁcients of theﬁlms were tested on the ball-on-disc tribometer. The results indicate that the sp3/sp2ratios in the ﬁlms canbe varied from 0.18 to 0.63 by changing Ti and Si contents at various CH4 ﬂow rates. The surface of the ﬁlmsbecomes smoother and more compact as the CH4 ﬂow rate increases. The lowest friction coefﬁcient is as lowas 0.0139 for the ﬁlm with Ti of 4.5 at.% and Si of 1.0 at.%. Especially, the ﬁlm exhibits a superlow value(μb0.01) under ambient air with 40% relative humidity in friction process. The superlow friction coefﬁcientin ambient air may be, attributable to synergistic effects of a combination of Ti and Si in the ﬁlm.
学科主题	材料科学与物理化学
收录类别	SCI
资助信息	the Natural Science Foundation of China (Grant No: 50823008,50905177, 50902133);973 Project (Grant; No. 2007CB607601) of the Ministry of Science and Technology of China.
语种	英语
公开日期	2012-09-28
内容类型	期刊论文
源URL	[http://210.77.64.217/handle/362003/985]
专题	兰州化学物理研究所_固体润滑国家重点实验室
通讯作者	Liu WM(刘维民)
推荐引用方式 GB/T 7714	Wang P,Hao JY,Liu WM. Structure and characteristics of amorphous (Ti,Si)–C:H ﬁlms deposited by reactive magnetron sputtering[J]. Diamond and Related Materials,2010,19:1172-1177.
APA	王鹏,郝俊英,&刘维民.(2010).Structure and characteristics of amorphous (Ti,Si)–C:H ﬁlms deposited by reactive magnetron sputtering.Diamond and Related Materials,19,1172-1177.
MLA	王鹏,et al."Structure and characteristics of amorphous (Ti,Si)–C:H ﬁlms deposited by reactive magnetron sputtering".Diamond and Related Materials 19(2010):1172-1177.