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	Enhanced photoelectrochemical performance of WO3 film with HfO2 passivation layer
	Liu, Yang; Li, Jie; Li, Wenzhang*; Liu, Qiong; Yang, Yahui; Li, Yaomin; Chen, Qiyuan
刊名	International Journal of Hydrogen Energy
	2015
卷号	40期号:29页码:8856-8863
关键词	WO3 HfO2 Passivation layer Photoelectrochemical performance
ISSN号	0360-3199
DOI	10.1016/j.ijhydene.2015.05.018
URL标识	查看原文
WOS记录号	WOS:000357228300010;EI:20152300914821
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5116161
专题	湖南农业大学
作者单位	1.[Li, Jie 2.Liu, Qiong 3.Liu, Yang 4.Li, Wenzhang 5.Chen, Qiyuan] Cent S Univ, Sch Chem & Chem Engn, Changsha 410083, Hunan, Peoples R China.
推荐引用方式 GB/T 7714	Liu, Yang,Li, Jie,Li, Wenzhang*,et al. Enhanced photoelectrochemical performance of WO3 film with HfO2 passivation layer[J]. International Journal of Hydrogen Energy,2015,40(29):8856-8863.
APA	Liu, Yang.,Li, Jie.,Li, Wenzhang*.,Liu, Qiong.,Yang, Yahui.,...&Chen, Qiyuan.(2015).Enhanced photoelectrochemical performance of WO3 film with HfO2 passivation layer.International Journal of Hydrogen Energy,40(29),8856-8863.
MLA	Liu, Yang,et al."Enhanced photoelectrochemical performance of WO3 film with HfO2 passivation layer".International Journal of Hydrogen Energy 40.29(2015):8856-8863.

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