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	Formation of silicon nanocrystal films at low temperature during capacitive radio frequency discharge transition to the high-current mode
	Xu, Yanmei[1]; Yu, Wei[2]; Jiang, Zhaoyi[3]; Li, Yun[4]; Li, Huimin[5]; Feng, Huina[6]
刊名	THIN SOLID FILMS
	2014
卷号	569页码:52-56
关键词	Silicon nanocrystal Crystallinity Radio frequency discharge High-current mode
ISSN号	0040-6090
DOI	http://dx.doi.org/10.1016/j.tsf.2014.08.037
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5079714
专题	河北大学
作者单位	1.[1]Hebei Univ, Coll Phys Sci & Technol, Baoding 071002, Hebei, Peoples R China. 2.North China Elect Power Univ, Coll Math & Phys, Beijing 071002, Hebei, Peoples R China. 3.[2]Hebei Univ, Coll Phys Sci & Technol, Baoding 071002, Hebei, Peoples R China. 4.[3]Hebei Univ, Coll Phys Sci & Technol, Baoding 071002, Hebei, Peoples R China. 5.[4]Hebei Univ, Coll Phys Sci & Technol, Baoding 071002, Hebei, Peoples R China. 6.[5]Hebei Univ, Coll Phys Sci & Technol, Baoding 071002, Hebei, Peoples R China. 7.[6]Hebei Univ, Coll Phys Sci & Technol, Baoding 071002, Hebei, Peoples R China.
推荐引用方式 GB/T 7714	Xu, Yanmei[1],Yu, Wei[2],Jiang, Zhaoyi[3],et al. Formation of silicon nanocrystal films at low temperature during capacitive radio frequency discharge transition to the high-current mode[J]. THIN SOLID FILMS,2014,569:52-56.
APA	Xu, Yanmei[1],Yu, Wei[2],Jiang, Zhaoyi[3],Li, Yun[4],Li, Huimin[5],&Feng, Huina[6].(2014).Formation of silicon nanocrystal films at low temperature during capacitive radio frequency discharge transition to the high-current mode.THIN SOLID FILMS,569,52-56.
MLA	Xu, Yanmei[1],et al."Formation of silicon nanocrystal films at low temperature during capacitive radio frequency discharge transition to the high-current mode".THIN SOLID FILMS 569(2014):52-56.

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