| Characterization of patterned oxide buried in bonded silicon-on-insulator wafers by near-infrared scattering topography and microscopy | |
| Wu, Xing; Uchikoshi, Junichi; Hirokane, Takaaki; Yamada, Ryuta; Takeuchi, Akihiro; Arima, Kenta; Morita, Mizuho | |
| 2008 | |
| 关键词 | near-infrared microscopy near-infrared scattering particle patterned buried oxide silicon on insulator failure analysis scattering topography |
| 卷号 | 47 |
| 期号 | 4 |
| DOI | 10.1143/JJAP.47.2511 |
| 页码 | 2511-2514 |
| 会议录 | JAPANESE JOURNAL OF APPLIED PHYSICS
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| URL标识 | 查看原文 |
| ISSN号 | 0021-4922 |
| WOS记录号 | WOS:000255449100037 |
| 内容类型 | 会议论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/4842899 |
| 专题 | 西安交通大学 |
| 推荐引用方式 GB/T 7714 | Wu, Xing,Uchikoshi, Junichi,Hirokane, Takaaki,et al. Characterization of patterned oxide buried in bonded silicon-on-insulator wafers by near-infrared scattering topography and microscopy[C]. 见:. |
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