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Ti/TiN multilayer thin films deposited by pulse biased arc ion plating
Zhao, Yanhui; Lin, Guoqiang; Xiao, Jinquan; Du, Hao; Dong, Chuang; Gao, Lijun
刊名APPLIED SURFACE SCIENCE
2011
卷号257页码:2683-2688
关键词Multilayer films Pulse biased arc ion plating Hardness Adhesion
ISSN号0169-4332
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/4838172
专题大连理工大学
作者单位1.Chinese Acad Sci, Specialized Mat & Devices Div, Dept Surface Engn, Inst Met Res, Shenyang 110016, Peoples R China.
2.Dalian Univ Technol, Key Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Dalian 116024, Peoples R China.
3.Chinese Acad Sci, Specialized Mat & Devices Div, Dept Surface Engn, Inst Met Res, 72 Wenhua Rd, Shenyang 110016, Peoples R China.
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GB/T 7714
Zhao, Yanhui,Lin, Guoqiang,Xiao, Jinquan,et al. Ti/TiN multilayer thin films deposited by pulse biased arc ion plating[J]. APPLIED SURFACE SCIENCE,2011,257:2683-2688.
APA Zhao, Yanhui,Lin, Guoqiang,Xiao, Jinquan,Du, Hao,Dong, Chuang,&Gao, Lijun.(2011).Ti/TiN multilayer thin films deposited by pulse biased arc ion plating.APPLIED SURFACE SCIENCE,257,2683-2688.
MLA Zhao, Yanhui,et al."Ti/TiN multilayer thin films deposited by pulse biased arc ion plating".APPLIED SURFACE SCIENCE 257(2011):2683-2688.
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