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	Emission properties of Ti-DLC films prepared by unbalanced magnetron sputtering
	Liang, H. F.; Liang, Z. H.; Liu, C. L.; Meng, L. G.
刊名	APPLIED SURFACE SCIENCE
	2010
卷号	256期号:6页码:1951-1954
关键词	Ti-DLC films Device structures Field emission
ISSN号	0169-4332
DOI	10.1016/j.apsusc.2009.10.043
URL标识	查看原文
WOS记录号	WOS:000273151900058
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4812124
专题	西安交通大学
推荐引用方式 GB/T 7714	Liang, H. F.,Liang, Z. H.,Liu, C. L.,et al. Emission properties of Ti-DLC films prepared by unbalanced magnetron sputtering[J]. APPLIED SURFACE SCIENCE,2010,256(6):1951-1954.
APA	Liang, H. F.,Liang, Z. H.,Liu, C. L.,&Meng, L. G..(2010).Emission properties of Ti-DLC films prepared by unbalanced magnetron sputtering.APPLIED SURFACE SCIENCE,256(6),1951-1954.
MLA	Liang, H. F.,et al."Emission properties of Ti-DLC films prepared by unbalanced magnetron sputtering".APPLIED SURFACE SCIENCE 256.6(2010):1951-1954.

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