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	A colossal dielectric constant of an amorphous TiO2:(Nb, In) film with low loss fabrication at room temperature
	Gai, Zhigang; Cheng, Zhenxiang; Wang, Xiaolin; Zhao, Lanling; Yin, Na; Abah, Roza; Zhao, Minglei; Hong, Fang; Yu, Zheyin; Dou, Shixue
刊名	Journal of Materials Chemistry C
	2014
卷号	2期号:33页码:6790-6795
DOI	10.1039/c4tc00500g
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4802771
专题	山东大学
作者单位	Institute for Superconducting and Electronic Mate
推荐引用方式 GB/T 7714	Gai, Zhigang,Cheng, Zhenxiang,Wang, Xiaolin,et al. A colossal dielectric constant of an amorphous TiO2:(Nb, In) film with low loss fabrication at room temperature[J]. Journal of Materials Chemistry C,2014,2(33):6790-6795.
APA	Gai, Zhigang.,Cheng, Zhenxiang.,Wang, Xiaolin.,Zhao, Lanling.,Yin, Na.,...&Dou, Shixue.(2014).A colossal dielectric constant of an amorphous TiO2:(Nb, In) film with low loss fabrication at room temperature.Journal of Materials Chemistry C,2(33),6790-6795.
MLA	Gai, Zhigang,et al."A colossal dielectric constant of an amorphous TiO2:(Nb, In) film with low loss fabrication at room temperature".Journal of Materials Chemistry C 2.33(2014):6790-6795.

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