Influence of Gas Pressure in Radio Frequency Sputtering on Microstructure and Optical Properties of VO2(M) Thin Films | |
Pan, SS | |
刊名 | science of advanced materials |
2012-02-01 | |
卷号 | 4期号:2 |
学科主题 | 纳米材料与技术 |
公开日期 | 2012-07-19 |
内容类型 | 期刊论文 |
源URL | [http://ir.hfcas.ac.cn/handle/334002/7628] |
专题 | 合肥物质科学研究院_中科院固体物理研究所 |
推荐引用方式 GB/T 7714 | Pan, SS. Influence of Gas Pressure in Radio Frequency Sputtering on Microstructure and Optical Properties of VO2(M) Thin Films[J]. science of advanced materials,2012,4(2). |
APA | Pan, SS.(2012).Influence of Gas Pressure in Radio Frequency Sputtering on Microstructure and Optical Properties of VO2(M) Thin Films.science of advanced materials,4(2). |
MLA | Pan, SS."Influence of Gas Pressure in Radio Frequency Sputtering on Microstructure and Optical Properties of VO2(M) Thin Films".science of advanced materials 4.2(2012). |
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