Influence of Gas Pressure in Radio Frequency Sputtering on Microstructure and Optical Properties of VO2(M) Thin Films
Pan, SS
刊名science of advanced materials
2012-02-01
卷号4期号:2
学科主题纳米材料与技术
公开日期2012-07-19
内容类型期刊论文
源URL[http://ir.hfcas.ac.cn/handle/334002/7628]  
专题合肥物质科学研究院_中科院固体物理研究所
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GB/T 7714
Pan, SS. Influence of Gas Pressure in Radio Frequency Sputtering on Microstructure and Optical Properties of VO2(M) Thin Films[J]. science of advanced materials,2012,4(2).
APA Pan, SS.(2012).Influence of Gas Pressure in Radio Frequency Sputtering on Microstructure and Optical Properties of VO2(M) Thin Films.science of advanced materials,4(2).
MLA Pan, SS."Influence of Gas Pressure in Radio Frequency Sputtering on Microstructure and Optical Properties of VO2(M) Thin Films".science of advanced materials 4.2(2012).
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