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	Electrical and magnetic properties of co-doped ZnO films deposited by RF magnetron sputtering
	Hui Sun; Sheng-Chi Chen; Chung-Hsien Wang; Yu-Wei Lin; Chao-Kuang Wen; Tung-Han Chuang; Xin Wang; Song-Sheng Lin; Ming-Jiang Dai
刊名	Surface and Coatings Technology
	2019
卷号	Vol.359页码:390-395
关键词	(Al, Co)-ZnO Electronic property Magnetic property RF sputtering Curie temperature
ISSN号	0257-8972
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4606844
专题	湖南大学
作者单位	1.e Institute of Materials Science and Engineering, Ocean University of China, Qingdao 266100, PR China f The Key Lab of Guangdong for Modern Surface Engineering Technology, National Engineering Laboratory for Modern Materials Surface Engineering Technology, Guangdong Institute of New Materials, 363 Changxing Road, Guangzhou 510651, PR China 2.College of Engineering, Chang Gung University, Taoyuan 333, Taiwan a School of Space Science and Physics, Shandong University at Weihai, 180 Wenhuaxi Road, Weihai 264209, PR China 3.Institute of Materials Science and Engineering, National Taiwan University, Taipei 106, Taiwan 4.Department of Materials Engineering and Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei City 24301, Taiwan
推荐引用方式 GB/T 7714	Hui Sun,Sheng-Chi Chen,Chung-Hsien Wang,et al. Electrical and magnetic properties of co-doped ZnO films deposited by RF magnetron sputtering[J]. Surface and Coatings Technology,2019,Vol.359:390-395.
APA	Hui Sun.,Sheng-Chi Chen.,Chung-Hsien Wang.,Yu-Wei Lin.,Chao-Kuang Wen.,...&Ming-Jiang Dai.(2019).Electrical and magnetic properties of co-doped ZnO films deposited by RF magnetron sputtering.Surface and Coatings Technology,Vol.359,390-395.
MLA	Hui Sun,et al."Electrical and magnetic properties of co-doped ZnO films deposited by RF magnetron sputtering".Surface and Coatings Technology Vol.359(2019):390-395.

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