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	Uniform Metal-Assisted Chemical Etching for Ultra-High-Aspect-Ratio Microstructures on Silicon
	Li L.; Tuan C.; Zhang C.; Chen Y.; Lian G.; Wong C.
刊名	Journal of Microelectromechanical Systems
	2018
关键词	high aspect ratio. Metal-assisted chemical etching silicon wet etch
DOI	10.1109/JMEMS.2018.2881510
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4571577
专题	山东大学
作者单位	1.School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, GA 30332 USA . 2.Sc
推荐引用方式 GB/T 7714	Li L.,Tuan C.,Zhang C.,et al. Uniform Metal-Assisted Chemical Etching for Ultra-High-Aspect-Ratio Microstructures on Silicon[J]. Journal of Microelectromechanical Systems,2018.
APA	Li L.,Tuan C.,Zhang C.,Chen Y.,Lian G.,&Wong C..(2018).Uniform Metal-Assisted Chemical Etching for Ultra-High-Aspect-Ratio Microstructures on Silicon.Journal of Microelectromechanical Systems.
MLA	Li L.,et al."Uniform Metal-Assisted Chemical Etching for Ultra-High-Aspect-Ratio Microstructures on Silicon".Journal of Microelectromechanical Systems (2018).

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